Growth

We are involved in studying the growth of the following classes of materials using

• Chemical Vapor Deposition (CVD)

• Pulsed Laser Deposition (PLD) techniques.

• Epitaxial layers of various Oxide semiconductors, such as ZnO, In2O3, NiO and Ga2O3 using CVD and PLD

• Monolayer or a few-layer thick large area continuous deposition of various transition metal dichalcogenides (TMDs), such as MoS2, WS2 etc. on different substrates using CVD

•  Vapor-liquid-solid growth of several tens of micrometer long nanowires of GaN and InN using CVD