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Growth

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We are involved in studying the growth of the following classes of materials using

  • Chemical Vapor Deposition (CVD)

  • Pulsed Laser Deposition (PLD) techniques.

  • Epitaxial layers of various Oxide semiconductors, such as ZnO, In2O3, NiO and Ga2O3 using CVD and PLD

  • Monolayer or a few-layer thick large area continuous deposition of various transition metal dichalcogenides (TMDs), such as MoS2, WS2 etc. on different substrates using CVD

  •  Vapor-liquid-solid growth of several tens of micrometer long nanowires of GaN and InN using CVD

Chemical Vapor Deposition (CVD)

Pulse LASER Deposition (PLD)

Various Furnaces for annealing

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